Nikon TU Plan ELWD 100X Brightfield Darkfield ObjectiveHigh magnification 100 industrial objective with 4. 5mm working distance for brightfield and darkfield reflected light microscopy of opaque materials. 100 Magnification, 0. 80 NA High resolution imaging with excellent resolving power for detailed surface inspection and analysis. 4. 5mm Extra Long Working Distance Extended clearance protects objective lens and accommodates varied surface topographies. Brightfield & Darkfield Capable Dual mode
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Nikon TU Plan ELWD 100X Brightfield Darkfield Objective